Multi-beam RF accelerators for ion implantation
| Autor: | Seidl, Peter A., Persaud, Arun, Di Domenico, Diego, Andreasson, Johan, Ji, Qing, Liang, Wei, Ni, Di, Oberson, Daniel, Raymond, Luke, Scharfstein, Gregory, Todd, Alan M. M., Lal, Amit, Schenkel, Thomas |
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| Rok vydání: | 2018 |
| Předmět: | |
| Druh dokumentu: | Working Paper |
| Popis: | We report on the development of a radio frequency (RF) linear accelerator (linac) for multiple-ion beams that is made from stacks of low cost wafers. The accelerator lattice is comprised of RF-acceleration gaps and electrostatic quadrupole focusing elements that are fabricated on 10-cm wafers made from printed circuit board or silicon. We demonstrate ion acceleration with an effective gradient of about 0.5 MV per meter with an array of 3 by 3 beams. The total ion beam energies achieved to date are in the 10 keV range with total ion currents in tests with noble gases of ~0.1mA. We discuss scaling of the ion energy (by adding acceleration modules) and ion currents (with more beams) for applications of this multi-beam RF linac technology to ion implantation and surface modification of materials. Comment: 4 pages, 7 figures, submitted to IIT 2018 (iit2018.org) |
| Databáze: | arXiv |
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