Observation of extreme-ultraviolet light emission from an expanding plasma jet with multiply-charged argon or xenon ions
| Autor: | Shalashov, A. G., Vodopyanov, A. V., Abramov, I. S., Sidorov, A. V., Gospodchikov, E. D., Razin, S. V., Chkhalo, N. I., Salashchenko, N. N., Glyavin, M. Yu., Golubev, S. V. |
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| Rok vydání: | 2018 |
| Předmět: | |
| Zdroj: | Appl. Phys. Lett. 113, 153502 (2018); https://doi.org/10.1063/1.5049126 |
| Druh dokumentu: | Working Paper |
| DOI: | 10.1063/1.5049126 |
| Popis: | We report the first direct demonstration of possibility to generate the extreme ultraviolet (EUV) radiation with a freely expanding jet of dense plasma with multiply-charged ions supported by high-power microwaves. The detected emission power is about 20 W at 18--50 nm for argon and xenon and 0.3 W at 13--17 nm for xenon. The discharge with a peak electron density up to $3\times 10^{16}\,$cm$^{-3}$ and a characteristic size of $150\,\mu$m is supported by a focused radiation of a recently developed gyrotron with unique characteristics, 250~kW output power at 250~GHz, operating in a relatively long (50$\,\mu$s) pulse mode. Up-scaling of these experimental results gives grounds for development of a point-like kilowatt-level EUV source for a high-resolution lithography able to fulfill requirements of the microelectronics industry. Comment: 5 pages, 3 figures, submitted to Appl. Phys. Lett. (2018) |
| Databáze: | arXiv |
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