Full field electron spectromicroscopy applied to ferroelectric materials
| Autor: | Barrett, N., Rault, J. E., Wang, J. L., Mathieu, C., Locatelli, A., Mentes, T. O., Nino, M. A., Fusil, S., Bibes, M., Barthelemy, A., Sando, D., Ren, W., Prosandeev, S., Bellaiche, L., Vilquin, B., Petraru, A., Krug, I. P., Schneider, C. M. |
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| Rok vydání: | 2018 |
| Předmět: | |
| Zdroj: | Journal of Applied Physics 113, 187217 (2013) |
| Druh dokumentu: | Working Paper |
| DOI: | 10.1063/1.4801968 |
| Popis: | The application of PhotoEmission Electron Microscopy (PEEM) and Low Energy Electron Microscopy (LEEM) techniques to the study of the electronic and chemical structure of ferroelectric materials is reviewed. Electron optics in both techniques gives spatial resolution of a few tens of nanometres. PEEM images photoelectrons whereas LEEM images reflected and elastically backscattered electrons. Both PEEM and LEEM can be used in direct and reciprocal space imaging. Together, they provide access to surface charge, work function, topography, chemical mapping, surface crystallinity and band structure. Examples of applications for the study of ferroelectric thin films and single crystals are presented. Comment: 15 pages, 9 figures |
| Databáze: | arXiv |
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