Spatially resolved, energy-filtered imaging of core level and valence band photoemission of highly p and n doped silicon patterns
Autor: | Barrett, N, Zagonel, L F, Renault, O, Bailly, A |
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Rok vydání: | 2017 |
Předmět: | |
Zdroj: | J. Phys.: Condens. Matter 21 314015 2009 |
Druh dokumentu: | Working Paper |
DOI: | 10.1088/0953-8984/21/31/314015 |
Popis: | An accurate description of spatial variations in the energy levels of patterned semiconductor substrates on the micron and sub-micron scale as a function of local doping is an important technological challenge for the microelectronics industry. Spatially resolved surface analysis by photoelectron spectromicroscopy can provide an invaluable contribution thanks to the relatively non-destructive, quantitative analysis. We present results on highly doped n and p type patterns on, respectively, p and n type silicon substrates. Using synchrotron radiation and spherical aberration-corrected energy filtering, we have obtained a spectroscopic image series at the Si 2p core level and across the valence band. Local band alignments are extracted, accounting for doping, band bending and surface photovoltage. Comment: 7 pages, 7 figures |
Databáze: | arXiv |
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