The granularity effect in amorphous InGaZnO$_4$ films prepared by rf sputtering method
Autor: | Zhang, Hui, Xie, Xin-Jian, Zhang, Xin-Hua, Li, Zhi-Qing |
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Rok vydání: | 2016 |
Předmět: | |
Druh dokumentu: | Working Paper |
DOI: | 10.1002/pssb.201700133 |
Popis: | We systematically investigated the temperature behaviors of the electrical conductivity and Hall coefficient of two series of amorphous indium gallium zinc oxides (a-IGZO) films prepared by rf sputtering method. The two series of films are $\sim$700\,nm and $\sim$25\,nm thick, respectively. For each film, the conductivity increases with decreasing temperature from 300\,K to $T_{\rm max}$, where $T_{\rm max}$ is the temperature at which the conductivity reaches its maximum. Below $T_{\rm max}$, the conductivity decreases with decreasing temperature. Both the conductivity and Hall coefficient vary linearly with $\ln T$ at low temperature regime. The $\ln T$ behaviors of conductivity and Hall coefficient cannot be explained by the traditional electron-electron interaction theory, but can be quantitatively described by the current electron-electron theory due to the presence of granularity. Combining with the scanning electron microscopy images of the films, we propose that the boundaries between the neighboring a-IGZO particles could make the film inhomogeneous and play an important role in the electron transport processes. Comment: 4 pages and 4 figures |
Databáze: | arXiv |
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