X-ray and neutron reflectometry study of copper surface reconstruction caused by implantation of high-energy oxygen ions
| Autor: | Khaydukov, Yu. N., Soltwedel, O., Marchenko, Yu. A., Khaidukova, D. Yu., Csik, A., Acartürk, T., Starke, U., Keller, T., Guglya, A. G., Kazdayev, Kh. R. |
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| Rok vydání: | 2014 |
| Předmět: | |
| Zdroj: | Journal of Surface Investigation 11, 206 (2017) |
| Druh dokumentu: | Working Paper |
| DOI: | 10.1134/S1027451017010293 |
| Popis: | Combination of neutron and X-ray reflectometry was used to study the vertical structure of 100 nm-thin copper films with implanted oxygen ions of energy E = [10-30] keV and doses D=[0.2-5.4]x$10^{16}$ $cm^{-2}$. The study shows that oxygen ion implantation with an energy of E = 30 keV leads to the formation of a 3 nm thick layer on the surface. Density and copper/oxygen stoichiometry of the observed surface layer are close to $Cu_2O$ oxide. We attribute the $Cu_2O$ oxide formation to highly mobilized copper atoms generated by stimulated ion implantation. Comment: 6 pages, 3 figures |
| Databáze: | arXiv |
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