| Autor: |
Cotter, J. P., Zeimpekis, I., Kraft, M, Hinds, E A |
| Rok vydání: |
2013 |
| Předmět: |
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| Zdroj: |
J. Micromech. Microeng. 23 117006 (2013) |
| Druh dokumentu: |
Working Paper |
| DOI: |
10.1088/0960-1317/23/11/117006 |
| Popis: |
We have studied the surface quality of millimeter-scale optical mirrors produced by etching CZ and FZ silicon wafers in potassium hydroxide to expose the $\{111\}$ planes. We find that the FZ surfaces have four times lower noise power at spatial frequencies up to $500\, {mm}^{-1}$. We conclude that mirrors made using FZ wafers have higher optical quality. |
| Databáze: |
arXiv |
| Externí odkaz: |
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