Effect of Thermal Annealing on Boron Diffusion, Micro-structural, Electrical and Magnetic properties of Laser Ablated CoFeB Thin Films
| Autor: | Swamy, G. Venkat, Pandey, Himanshu, Srivastava, A. K., Dalai, M. K., Maurya, K. K., Rashmi, Rakshit, R. K. |
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| Rok vydání: | 2013 |
| Předmět: | |
| Zdroj: | AIP Advances 3, 072129 (2013) |
| Druh dokumentu: | Working Paper |
| DOI: | 10.1063/1.4816811 |
| Popis: | We report on Boron diffusion and subsequent crystallization of Co$_{40}$Fe$_{40}$B$_{20}$ (CoFeB) thin films on SiO$_2$/Si(001) substrate using pulsed laser deposition. Secondary ion mass spectroscopy reveals Boron diffusion at the interface in both amorphous and crystalline phase of CoFeB. High-resolution transmission electron microscopy reveals a small fraction of nano-crystallites embedded in the amorphous matrix of CoFeB. However, annealing at 400$^\circ$C results in crystallization of CoFe with \textit{bcc} structure along (110) orientation. As-deposited films are non-metallic in nature with the coercivity (H$_c$) of 5Oe while the films annealed at 400$^\circ$C are metallic with a H$_c$ of 135Oe. Comment: 16 pages, 6 figures |
| Databáze: | arXiv |
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