Fabrication of high quality sub-micron Au gratings over large areas with pulsed laser interference lithography for SPR sensors
Autor: | Arriola, Alexander, Rodriguez, Ainara, Perez, Noemi, Tavera, Txaber, Withford, Michael J., Fuerbach, Alexander, Olaizola, Santiago M. |
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Rok vydání: | 2013 |
Předmět: | |
Zdroj: | Optical Materials Express, Vol. 2, Issue 11, pp. 1571-1579 (2012) |
Druh dokumentu: | Working Paper |
DOI: | 10.1364/OME.2.001571 |
Popis: | Metallic gratings were fabricated using high energy laser interference lithography with a frequency tripled Nd:YAG nanosecond laser. The grating structures were first recorded in a photosensitive layer and afterwards transferred to an Au film. High quality Au gratings with a period of 770 nm and peak-to-valley heights of 20-60 nm exhibiting plasmonic resonance response were successfully designed, fabricated and characterized. Comment: 10 pages, 7 figures |
Databáze: | arXiv |
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