Improved magnetization in sputtered dysprosium thin films
Autor: | Scheunert, G., Hendren, W. R., Lapicki, A. A., Hardeman, R., Gubbins, M., Bowman, R. M. |
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Rok vydání: | 2013 |
Předmět: | |
Druh dokumentu: | Working Paper |
DOI: | 10.1088/0022-3727/46/15/152001 |
Popis: | 50nm thick nanogranular polycrystalline dysprosium thin films have been prepared via ultra-high vacuum DC sputtering on SiO2 and Si wafers. The maximum in-plane spontaneous magnetization at T = 4K was found to be MS4K = 3.28T for samples deposited on wafers heated to 350C with a Neel point of TN = 173K and a ferromagnetic transition at TC = 80K, measured via zero field cooled field cooled magnetization measurements, close to single crystal values. The slightly reduced magnetization is explained in the light of a metastable face centered cubic crystal phase which occurred at the seed interface and granularity related effects, that are still noticeably influential despite an in-plane magnetic easy axis. As deposited samples showed reduced magnetization of MS4K = 2.26T, however their ferromagnetic transition shifted to a much higher temperature of TC = 172K and the antiferromagnetic phase was completely suppressed probably as a result of strain. Comment: 16 pages, 3 figures |
Databáze: | arXiv |
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