| Autor: |
Sandberg, Martin, Vissers, Michael R., Kline, Jeffrey S., Weides, Martin, Gao, Jiansong, Wisbey, David S., Pappas, David P. |
| Rok vydání: |
2012 |
| Předmět: |
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| Zdroj: |
Appl. Phys. Lett. 100, 262605 (2012) |
| Druh dokumentu: |
Working Paper |
| DOI: |
10.1063/1.4729623 |
| Popis: |
We have investigated the correlation between the microwave loss and patterning method for coplanar waveguide titanium nitride resonators fabricated on Si wafers. Three different methods were investigated: fluorine- and chlorine-based reactive ion etches and an argon-ion mill. At high microwave probe powers the reactive etched resonators showed low internal loss, whereas the ion-milled samples showed dramatically higher loss. At single-photon powers we found that the fluorine-etched resonators exhibited substantially lower loss than the chlorine-etched ones. We interpret the results by use of numerically calculated filling factors and find that the silicon surface exhibits a higher loss when chlorine-etched than when fluorine-etched. We also find from microscopy that re-deposition of silicon onto the photoresist and side walls is the probable cause for the high loss observed for the ion-milled resonators |
| Databáze: |
arXiv |
| Externí odkaz: |
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