| Autor: |
Frastia, Lubor, Archer, Andrew J., Thiele, Uwe |
| Rok vydání: |
2010 |
| Předmět: |
|
| Zdroj: |
Phys. Rev. Lett. 106, 077801 (2011) |
| Druh dokumentu: |
Working Paper |
| DOI: |
10.1103/PhysRevLett.106.077801 |
| Popis: |
We describe the formation of deposition patterns that are observed in many different experiments where a three-phase contact line of a volatile nanoparticle suspension or polymer solution recedes. A dynamical model based on a long-wave approximation predicts the deposition of irregular and regular line patterns due to self-organised pinning-depinning cycles corresponding to a stick-slip motion of the contact line. We analyze how the line pattern properties depend on the evaporation rate and solute concentration. |
| Databáze: |
arXiv |
| Externí odkaz: |
|
