Position controlled self-catalyzed growth of GaAs nanowires by molecular beam epitaxy
Autor: | Bauer, Benedikt, Rudolph, Andreas, Soda, Marcello, Morral, Anna Fontcuberta i, Zweck, Josef, Schuh, Dieter, Reiger, Elisabeth |
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Rok vydání: | 2010 |
Předmět: | |
Zdroj: | Nanotechnology 21 (2010) 435601 |
Druh dokumentu: | Working Paper |
DOI: | 10.1088/0957-4484/21/43/435601 |
Popis: | GaAs nanowires are grown by molecular beam epitaxy using a self-catalyzed, Ga-assisted growth technique. Position control is achieved by nano-patterning a SiO2 layer with arrays of holes with a hole diameter of 85 nm and a hole pitch varying between 200 nm and 2 \mum. Gallium droplets form preferentially at the etched holes acting as catalyst for the nanowire growth. The nanowires have hexagonal cross-sections with {110} side facets and crystallize predominantly in zincblende. The interdistance dependence of the nanowire growth rate indicates a change of the III/V ratio towards As-rich conditions for large hole distances inhibiting NW growth. Comment: 9 pages, 4 figures |
Databáze: | arXiv |
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