Diffuse-interface model for nanopatterning induced by self-sustained ion etch masking

Autor:	Roy, S. Le, Søndergård, E., Kildemo, M., Nerbø, I. S., Plapp, M.
Rok vydání:	2010
Předmět:	Condensed Matter - Materials Science
Zdroj:	Phys. Rev. B 81, 161401(R), 2010
Druh dokumentu:	Working Paper
DOI:	10.1103/PhysRevB.81.161401
Popis:	We construct a simple phenomenological diffuse-interface model for composition-induced nanopatterning during ion sputtering of alloys. In simulations, this model reproduces without difficulties the high-aspect ratio structures and tilted pillars observed in experiments. We investigate the time evolution of the pillar height, both by simulations and by {\it in situ} ellipsometry. The analysis of the simulation results yields a good understanding of the transitions between different growth regimes and supports the role of segregation in the pattern-formation process. Comment: 10 pages, 3 figures; minor revisions with respect to first version; figures nicened; journal ref. added
Databáze:	arXiv
Externí odkaz:	http://arxiv.org/abs/1003.1274 Zobrazit plný text záznamu View this record from Arxiv