Anomalous diffusion mediated by atom deposition into a porous substrate

Autor:	Brault, Pascal, Josserand, Christophe, Bauchire, Jean-Marc, Caillard, Amael, Charles, Christine, Boswell, Rod W.
Rok vydání:	2009
Předmět:	Condensed Matter - Statistical Mechanics
Zdroj:	Physical Review Letters 102 (2009) 045901
Druh dokumentu:	Working Paper
DOI:	10.1103/PhysRevLett.102.045901
Popis:	Constant flux atom deposition into a porous medium is shown to generate a dense overlayer and a diffusion profile. Scaling analysis shows that the overlayer acts as a dynamic control for atomic diffusion in the porous substrate. This is modeled by generalizing the porous diffusion equation with a time-dependent diffusion coefficient equivalent to a nonlinear rescaling of time Comment: 4 pages
Databáze:	arXiv
Externí odkaz:	http://arxiv.org/abs/0902.2618 Zobrazit plný text záznamu View this record from Arxiv