| Autor: |
Wataru, Kubota, Toru, Utsunomiya, Takashi, Ichii, Hiroyuki, Sugimura |
| Rok vydání: |
2021 |
| Zdroj: |
Langmuir : the ACS journal of surfaces and colloids. |
| ISSN: |
1520-5827 |
| Popis: |
Chemical etching of silicon assisted by various types of carbon materials is drawing much attention for the fabrication of silicon micro/nanostructures. We developed a method of chemical etching of silicon that utilizes graphene oxide (GO) sheets to promote the etching reaction in a hydrofluoric acid-nitric acid (HF-HNO |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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