Enhanced Thermoelectric Transport and Stability in Atomic Layer Deposited-HfO

Autor:	Jenichi, Felizco, Taneli, Juntunen, Mutsunori, Uenuma, Jarkko, Etula, Camilla, Tossi, Yasuaki, Ishikawa, Ilkka, Tittonen, Yukiharu, Uraoka
Rok vydání:	2020
Zdroj:	ACS applied materialsinterfaces. 12(43)
ISSN:	1944-8252
Popis:	Herein, enhancements in thermoelectric (TE) performance, both the power factor (PF) and thermal stability, are exhibited by sandwiching HfO
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=pmid________::90ecf6c7e4af9c84f459789576584b28 https://pubmed.ncbi.nlm.nih.gov/32970947 Zobrazit plný text záznamu