Efficient reversible phase mask for TiO
| Autor: | L, Berthod, M, Bichotte, I, Verrier, C, Veillas, T, Kämpfe, F, Vocanson, M, Langlet, J, Laukkanen, O, Parriaux, Y, Jourlin |
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| Rok vydání: | 2017 |
| Zdroj: | Optics express. 25(8) |
| ISSN: | 1094-4087 |
| Popis: | In this article we present a radial phase mask specially designed and manufactured for direct micro-structuration under UV photolithography of a cylindrical surface covered by a photoresist TiO |
| Databáze: | OpenAIRE |
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