Effects of Ar Addition to O
| Autor: | Hanearl, Jung, Il-Kwon, Oh, Chang Mo, Yoon, Bo-Eun, Park, Sanghun, Lee, Ohyung, Kwon, Woo Jae, Lee, Se-Hun, Kwon, Woo-Hee, Kim, Hyungjun, Kim |
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| Rok vydání: | 2018 |
| Zdroj: | ACS applied materialsinterfaces. 10(46) |
| ISSN: | 1944-8252 |
| Popis: | A method for significantly increasing the growth rates (GRs) of high- k oxide thin films grown via plasma-enhanced atomic layer deposition (PE-ALD) by enhancing the plasma density through the addition of Ar gas to the O |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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