| Autor: |
Yeong Jae, Shin, Lingfei, Wang, Yoonkoo, Kim, Ho-Hyun, Nahm, Daesu, Lee, Jeong Rae, Kim, Sang Mo, Yang, Jong-Gul, Yoon, Jin-Seok, Chung, Miyoung, Kim, Seo Hyoung, Chang, Tae Won, Noh |
| Rok vydání: |
2017 |
| Zdroj: |
ACS applied materialsinterfaces. 9(32) |
| ISSN: |
1944-8252 |
| Popis: |
With recent trends on miniaturizing oxide-based devices, the need for atomic-scale control of surface/interface structures by pulsed laser deposition (PLD) has increased. In particular, realizing uniform atomic termination at the surface/interface is highly desirable. However, a lack of understanding on the surface formation mechanism in PLD has limited a deliberate control of surface/interface atomic stacking sequences. Here, taking the prototypical SrRuO |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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