A Study on the Etching and Surface Characteristics of SiOC Thin Films After C
| Autor: | Junmyung, Lee, Yeonsik, Choi, Yunho, Nam, Byung Jun, Lee, Hyun Woo, Lee, Kwang-Ho, Kwon |
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| Rok vydání: | 2021 |
| Předmět: | |
| Zdroj: | Journal of nanoscience and nanotechnology. 21(10) |
| ISSN: | 1533-4899 |
| Popis: | Silicon oxycarbide (SiOC) film was etched using a CF₄/C |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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