Atomic layer deposition of LiF using LiN(SiMe

Autor:	N, Hornsveld, W M M, Kessels, R A, Synowicki, M, Creatore
Rok vydání:	2021
Zdroj:	Physical chemistry chemical physics : PCCP. 23(15)
ISSN:	1463-9084
Popis:	Lithium fluoride films were prepared by atomic layer deposition (ALD) using a new route in which LiN(SiMe
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=pmid________::1e35f41ef4f09256bdf8b9d5edc0647c https://pubmed.ncbi.nlm.nih.gov/33885050 Zobrazit plný text záznamu