Phase analysis in alpha-Fe after high-dose Si ion implantation by depth-selective conversion-electron Mössbauer spectroscopy (DCEMS)
| Autor: | Walterfang, M., Kruijer, S., Dobler, M., Reuther, H., Keune, W. |
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| Jazyk: | angličtina |
| Rok vydání: | 2000 |
| Zdroj: | Hyperfine Interactions 126 (2000) 219-222 |
| Popis: | Si+ ions of 50 keV in energy were implanted into a-Fe (95% 57Fe) with a nominal dose of 5x10E17 cmE-2. |
| Databáze: | OpenAIRE |
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