| Popis: |
The design of a high voltage pulsing system for a plasma immersion ion implantation (PIII) facility is presented. A list of requirements, which have to be fulfilled by a high voltage pulse generator to get best results and a optimum operation of the PIII system, is given. A simple electrical model of the plasma is presented which describes the plasma as a capacitive-resistive load. The model parameters are determined to fit experimental results. The requirements for the pulse generator can be fulfilled well using a pulse generator design which employs a hard tube switch. A pulse generator design is presented which is especially optimized for PIII systems. Especially the hard tube control is optimized for obtaining voltage rise times as short as possible. Comments or further questions to: brutscher@fz-rossendorf.de |
