Monte Carlo simulation of MOSFETs with band-offsets in the source and drain

Autor: BRACCIOLI, MARCO, FIEGNA, CLAUDIO, SANGIORGI, ENRICO, P. Palestri, T. Poiroux, M. Vinet, G. Le Carval, M. Mouis
Přispěvatelé: YOURI V. PONOMAREV, M. Braccioli, P. Palestri, T. Poiroux, M. Vinet, G. Le Carval, M. Moui, C. Fiegna, E. Sangiorgi
Jazyk: angličtina
Rok vydání: 2007
Předmět:
Popis: Full-band Monte Carlo simulation of short-channel Double-Gate SOI MOSFETs were used to assess possible improvement of drain current in devices featuring conduction-band offsets between the source and the channel, obyained adopting non-conventional materials for the source and drain regions.
Databáze: OpenAIRE