Optimization of deposition parameters in order to create a photocatalytic titanium oxide films produced by PECVD

Autor:	PEKÁREK, Michal
Jazyk:	čeština
Rok vydání:	2013
Předmět:	titanium oxide plazma TiO2 nízkotlaká depozice oxid titaničitý PECVD surface treatment fotokatalytické vrstvy photocatalytic thin films plasma reactor plazmový výboj povrchová úprava photocatalysis plasma discharge fotokatalýza plasma plazmový reaktor low-pressure deposition
Popis:	This thesis presents Photocatalytic TiOx layers created by own PECVD reactor assembled in the building of Department of Applied Physics and Technics. Parameters of depositions were optimalized as well as the PECVD reactor itself. Final layers are compared to layers made by Degussa P25. As a result based on the included measurements, this thesis tries to answer the question whether PECVD is the suitable method for depositions of photocatalytic layers.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=od______2186::9245d8104fa8e75f48341babb33c7e40 http://www.nusl.cz/ntk/nusl-153375 Zobrazit plný text záznamu