Investigating electrically active defect distributions in MOS structures based on inelastic tunneling interaction with border traps and a nonlocal model for interface traps

Autor: Caruso, Enrico, Lin, Jun, Monaghan, Scott, Cherkaoui, Karim, Gity, Farzan, Palestri, Pierpaolo, Esseni, David, Selmi, Luca, Hurley, Paul K.
Jazyk: angličtina
Rok vydání: 2019
Předmět:
Popis: This work demonstrates that when inelastic band-to-trap tunneling is considered, border traps aligned with the semiconductor bandgap play a significant role in the C-V/G-V dispersion of a MOS structure. In addition, for the case of quantization, a non-local model for interface states is required. The model is used to evaluate the energy/depth distribution of border traps in a n-In0.53Ga0.47As /Al2O3 MOS system.
Databáze: OpenAIRE