Properties of CdTe thin films prepared by hot wall epitaxy

Autor: Bilevych, Ye.O., Boka, A.I., Darchuk, L.O., Gumenjuk-Sichevska, J.V., Sizov, F.F., Boelling, O., Sulkio-Cleff, B.
Jazyk: angličtina
Rok vydání: 2004
Popis: CdTe thin films were grown on different substrates: BaF₂ (111), polished Si (100), SiO₂, bulk CdTe (110) and HgxCd₁₋xTe layers by hot wall epitaxy (HWE). Chosen temperature parame-ters and technological process of thin film fabrication provided the growth rate of about 0.03 mm/min. The current-voltage characteristics and transmission spectra were measured. X-ray diffrac-tion data (XRD) measurements were carried out as well.
Databáze: OpenAIRE