| Přispěvatelé: |
Du, Ke, Siauw, Meiliana, Valade, David, Jasieniak, Marek, Voelcker, Nico, Trefonas, Peter, Thackeray, Jim, Blakey, Idriss, Whittaker, Andrew, Advances in Patterning Materials and Processes XXXIV 2017 San Jose, United States 27 February-2 March 2017 |
| Popis: |
Out of band (OOB) radiation from the EUV source has significant implications for the performance of EUVL photoresists. Here we introduce a surface-Active polymer additive, capable of partitioning to the top of the resist film during casting and annealing, to protect the underlying photoresist from OOB radiation. Copolymers were prepared using reversible addition-fragmentation chain transfer (RAFT) polymerization, and rendered surface active by chain extension with a block of fluoro-monomer. Films were prepared from the EUV resist with added surface-Active Embedded Barrier Layer (EBL), and characterized using measurements of contact angles and spectroscopic ellipsometry. Finally, the lithographic performance of the resist containing the EBL was evaluated using Electron Beam Lithography exposure. Refereed/Peer-reviewed |
