Istraživanje reaktivno nanešenih NbN slojeva
| Autor: | Hotovy, Ivan, Brcka, Jozef, Huran, Jozef |
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| Jazyk: | angličtina |
| Rok vydání: | 1995 |
| Zdroj: | Fizika A : a journal of experimental and theoretical physics Volume 4 Issue 2 |
| ISSN: | 1333-9125 1330-0008 |
| Popis: | We have investigated the structural properties of thin films of reactively magnetron sputtered niobium nitride (NbN) under high-temperature annealing (with annealing temperatures ranging 850 to 950 ° C) and with different nitrogen contents in the working gas mixture. Prepared NbN films were characterized by Auger electron spectroscopy (AES) and X-ray diffraction (XRD). The influence of rapid thermal annealing (RTA) on a change of the structure properties and surface morphology was investigated. The correlation between technological parameters and film properties, structure and composition were established. Istraživana su strukturna svojstva tankih slojeva niobium nitrida (NbN) reaktivnorasprašenih magnetronom, uz visoko-temperaturno otpuštanje (na 850 do 950 ◦C), s različitim sadržajima dušika u radnom plinu. Dobiveni NbN tanki slojevi istraženi su Augerovom elektronskom spektroskopijom (AES) i rendgenskom difrakcijom (XRD). Proučavan je utjecaj brzog toplinskog otpuštanja na strukturna svojstva i površinu slojeva. |
| Databáze: | OpenAIRE |
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