| Autor: |
MASAO KAMIKO, HIROAKI CHIHAYA, WATARU SUGIMOTO, RYOICHI YAMAMOTO, SANGMUN OH, JUNHUA XU, ISAO KOJIMA |
| Rok vydání: |
2006 |
| Předmět: |
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| Zdroj: |
Surface Review and Letters. 13(02):201-207 |
| Popis: |
We have investigated the effect of Bi on the heteroepitaxial growth of Co on Cu by reflection high-energy electron diffraction (RHEED) measurements. It was found that Bi enhanced the layer-by-layer growth of Co on the Cu(111) surfaces at 100°C. The dependence of the growth on Bi layer thickness suggested that there existed a suitable amount of Bi surfactant layer that enhanced smoother layered growth. On the contrary, for the case of Co growth on Cu(100), Bi depressed the layer-by-layer growth of Co on Cu(100). The surface segregation effect of Bi was also studied by Auger electron spectroscopy (AES). |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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