| Autor: |
Kim, H., Li, W., Marconi, M.C., Brocklesby, W.S., Juschkin, L. |
| Přispěvatelé: |
Publica |
| Jazyk: |
angličtina |
| Rok vydání: |
2016 |
| Popis: |
Self-imaging is a well-known optical phenomenon produced by diffraction of a coherent beam in a periodic structure. The self-imaging effect (or Talbot effect) replicates the field intensity at a periodic mask in certain planes, effectively producing in those planes an image of the mask. However, the effect has not been analyzed for a rough-line grid from the point of view of the fidelity of the image. In this paper, we investigate the restorative effect of the self-image applied to the lithography of gratings with rough lines. This paper is applied to characterize a Talbot lithography experiment implemented in the extreme ultraviolet. With the self-imaging technique, a mask with grid patterns having bumps randomly placed along the line edges reproduces a grid pattern with smoothed line edges. Simulation explores the approach further for the cases of sub-100-nm pitch grids. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
|
