Projection optics for EUVL micro-field exposure tools with a numerical aperture of 0.5
| Autor: | Glatzel, Holger |
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| Jazyk: | angličtina |
| Rok vydání: | 2013 |
| Předmět: | |
| Zdroj: | Glatzel, Holger. (2013). Projection optics for EUVL micro-field exposure tools with a numerical aperture of 0.5. Proc. SPIE, 8679, 867917, April 2013. doi: 10.1117/12.2012698. Lawrence Berkeley National Laboratory: Lawrence Berkeley National Laboratory. Retrieved from: http://www.escholarship.org/uc/item/2hf6t4gp |
| DOI: | 10.1117/12.2012698. |
| Databáze: | OpenAIRE |
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