Correlation between process conditions, chemical composition and morphology of MoS2 films prepared by RF planar magnetron sputtering

Autor:	Bichsel, R, Buffat, PA, Lévy, F
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=od_______185::3619caedaccf1cde37739987193bc323 https://infoscience.epfl.ch/record/100373 Zobrazit plný text záznamu