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Natural as well as technological plasmas are well known source for thin films or for dust particles. Even more, the observation of the dust particles has a long history in physics – their role in laboratory and cosmic plasmas was discussed early on by, for example, Langmuir, Spitzer and Alfvén, the pioneers of plasma physics in the 20th century. Langmuir described the "profound effects he observed in an arc discharge when minute droplets of tungsten vapor were sputtered from the cathode into the plasma” already in his speech in 1924. And although it was clear already in the 20ties that dust particles in plasmas have “profound effects”, the further, rapid explosion of investigations in this field had to wait for about 50 years, for new technologies, diagnostic methods and applications. This new development included also the variety of the new materials that can be produced by different types of plasmas. The investigation of particle formation in plasmas is nowadays of great interest in various branches ofphysics and technology - in astrophysics [1, 2] in fusion processes [3, 4], and in processing plasmas [5, 6, 7]. The generation of particles ranging from nanometer to micrometer size scale was observed in several kinds of discharge types: in inductively and capacitively coupled RF-discharges, in microwave discharges and in DC-glow discharges... Development of the technology enables also progress in the synthesis , growth and analysis of other materials in the plasmas: starting with thin film deposition, nanotubes, nanorods, nanowalls, graphene and other 2D structures (based on semiconductors, metals, oxides, etc see eg Ref[8]). The processes have either homogeneous and heterogeneous pathways, can be starting from catalyst or without catalysts, and can finally form heterogeneous structures and give as result multimaterials (eg 2D plasma grown structures decorated with plasma synthesized nanoparticles, graphene enrobed in plasma polymers).The phenomenon of dust particle growth, as well as growth of various other structures involves both plasma physics and plasma chemistry; reaching further in the fields of material analysis, chemistry, and solid state physics, thus being highly interdisciplinary.The intriguing questions in this field still concern:• the origin of dust particles in different processes and environments (formation pathways),• the growth/synthesis or deposition of various structures: when is which process, onset of new material from nanosized nuclei or seeds to submicron or micron sized,• plasma response to various growth processes in the volume or bulk• the changes of the material characteristics of the materials during their growth in plasmasAcknowledgementsThe authors would like to acknowledge the support obtained by FET OPEN H2020 project PEGASUS,as well as FLAG -ERA NET project VEGA .References[1] G. Praburam and J. Goree, ApJ 441(1995) 830[2] E. Kovacevic, I. Stefanovic, J. Berndt, Y.J. Pendleton, and J. Winter, ApJ 620 (2005)2924[3] J. Winter, Plasma Phys. Contr. Fusion 46 (2004) B583[4] S. I. Krasheninnikov, R.D. Smirnov and D. L. Rudakov, Plasma Phys. Control. Fusion 53 (2011) 083001[5] T.I Shigaki, J-G. Li, Science and Technology of Advanced Materials 8 (2007) 617[6] Z. C. Holman, U. R. Kortshagen. Langmuir 25 (2009) 11883[7] J. Berndt, E. Kovacevic, I. Stefanovic, O. Stepanovic, S. H. Hong, J. Winter Contrib. Plasma Phys.,49 (2009)107[8] N.M. Santhosh, G. Filipič, E. Tatarova, O. Baranov, H.Kondo, M. Sekine, M. Hori, K. Ostrikov, U. Cvelbar Micromachines 9 (2018) 565 |
