Kinetic study of the chemical vapor deposition of tin oxidereactor design, 'Coatings on Glass 1998'
| Autor: | Mol, van, A.M.B., Alcott, G.R., Croon, de, M.H.J.M., Spee, C.I.M.A., Schouten, J.C., Pulker, H., Schmidt, H., Aegerter, M.A. |
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| Přispěvatelé: | Chemical Reactor Engineering, Plasma & Materials Processing |
| Jazyk: | angličtina |
| Rok vydání: | 1999 |
| Zdroj: | Selected papers from the 2nd International Conference on Coatings on Glass (ICCG) : Convention Center, Saarbrücken, Germany, September 6-10, 1998 ; [high-performance coatings for transparent systems in large-area and/or high-volume applications], 178-180 STARTPAGE=178;ENDPAGE=180;TITLE=Selected papers from the 2nd International Conference on Coatings on Glass (ICCG) : Convention Center, Saarbrücken, Germany, September 6-10, 1998 ; [high-performance coatings for transparent systems in large-area and/or high-volume applications] |
| Popis: | Chem. Vapor Deposition is the result of a complicated interplay between gas phase chem., surface chem., and fluid dynamics of the reactor system. To improve in-line process control of an industrial deposition process, knowledge of all three phenomena is necessary. To study the intrinsic gas phase and surface kinetics of such a process at atm. pressure, a continuously stirred tank reactor has been designed. Gas phase kinetics is detd. using in situ Fourier transform IR spectroscopy and mass spectroscopy, whereas deposition rates are measured in situ with a microbalance. The present objective is a kinetic study of the intrinsic gas phase and surface chem. of the atm. pressure chem. vapor deposition of SnO2 layers on glass. |
| Databáze: | OpenAIRE |
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