Plasma enhanced chemical vapor deposition of ZnO : AI Iayers for thin film photovoltaics : control on the film growth

Autor: Creatore, M., Volintiru, I., Spee, C.I.M.A., Sanden, van de, M.C.M.
Přispěvatelé: Plasma & Materials Processing, Applied Physics, Interfaces in future energy technologies
Jazyk: angličtina
Rok vydání: 2009
Zdroj: Proceedings of the 11th International Conference on Plasma Surface Engineering : Conference and Exhibition (PSE 2008), September 15-19, 2008, Garmisch-Partenkirchen, Germany (Abstracts), 16-16
STARTPAGE=16;ENDPAGE=16;TITLE=Proceedings of the 11th International Conference on Plasma Surface Engineering : Conference and Exhibition (PSE 2008), September 15-19, 2008, Garmisch-Partenkirchen, Germany (Abstracts)
Databáze: OpenAIRE