Improved method for solving LTE diffusion problems with Plasimo

Autor: van Boxtel, J., Peerenboom, K.S.C., Dijk, van, J.
Přispěvatelé: Applied Physics, Elementary Processes in Gas Discharges, Plasimo is a framework for modelling low-temperature plasma sources
Jazyk: angličtina
Rok vydání: 2012
Zdroj: 15th Euregional Workshop on the Exploration of Low Temperature Plasma Physics (WELTPP 2012)
Databáze: OpenAIRE