Investigating Hot-Carrier Degradation in MOSFETs using Constant and Switched Biased Low-Frequency Noise measurements
Autor: | Kolhatkar, J.S., Hoekstra, E., Hof, A.J., Salm, C., Wallinga, H., Schmitz, J. |
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Jazyk: | angličtina |
Rok vydání: | 2004 |
Předmět: | |
Zdroj: | Proceedings SAFE & ProRISC 2004, 700-703 STARTPAGE=700;ENDPAGE=703;TITLE=Proceedings SAFE & ProRISC 2004 |
Popis: | Periodically switching the MOSFET ‘off’ (switched biasing), is known to reduce the low-frequency (LF) noise power spectrum. In this work, the constant and switched biased LF noise has been measured on devices before and after hot-carrier stress. The switched biased LF noise is more sensitive to hot-carrier degradation than the constant biased LF noise. The anomalous noise reduction, due to switched biasing, observed for fresh devices, gradually disappears as the devices are subjected to hot-carrier stress. Devices with a deuterium passivated SiO2/Si interface degrade significantly slower, as seen from our LF noise measurements. |
Databáze: | OpenAIRE |
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