Angled etching of (001) rutile Nb-TiO2 substrate using SF6-based capacitively coupled plasma reactive ion etching

Autor:	matsutani, akihiro, Nishioka, Kunio, Sato, Mina, Shoji, Dai, Kobayashi, Daito, Isobe, Toshihiro, Nakajima, Akira, Tatsuma, Toru, Matsushita, Sachiko
Jazyk:	angličtina
Rok vydání:	2014
Zdroj:	Japanese Journal of Applied Physics. 53
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=jairo_______::f33384525c57bbe80067e4e6c6aa9a04 http://t2r2.star.titech.ac.jp/cgi-bin/publicationinfo.cgi?q_publication_content_number=CTT100692928 Zobrazit plný text záznamu