STUDY ON IRRADIATION EFFECTS BY FEMTOSECOND-PULSED EXTREME ULTRAVIOLET IN MAIN-CHAIN SCISSION RESIST
| Autor: | Hosaka, Yuji, Yamamoto, Hiroki, Ishino, Masahiko, Dinh, Thanhhung, Nishikino, Masaharu, Maekawa, Yasunari, Yuji, Hosaka, Hiroki, Yamamoto, Masahiko, Ishino, Masaharu, Nishikino, Yasunari, Maekawa |
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| Jazyk: | angličtina |
| Rok vydání: | 2020 |
| Popis: | Femtosecond-pulsed extreme ultraviolet (EUV) of free-electron laser (FEL) is the most potential candidates for a next-generation EUV lithography light source. However, the physical events and chemical reactions in resist materials, induced by EUV with a short pulse width and high power intensity, have not yet been elucidated. In our previous study, the morphological and chemical changes in poly(methyl methacrylate) (PMMA) induced by picosecond-pulsed EUV were investigated using an X-ray laser. The sensitivity of PMMA upon exposure to a 7 ps EUV pulse was much enhanced in comparison with that using conventional EUV sources, which have a typical pulse width of the order of nanoseconds. In this study, the sensitivity of PMMA upon exposure to femtosecond-pulsed EUV was investigated by using FEL to obtain the resist design for next-generation EUV lithography. 33rd International Microprocesses and Nanotechnology Conference (MNC 2020) |
| Databáze: | OpenAIRE |
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