High speed deposition of SiO2 films with plasma jet based on capillary dielectric barrier discharge at atmospheric pressure
| Autor: | Ito, Yosuke, Urabe, Keiichiro, Takano, Nobuhiko, Tachibana, Kunihide |
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| Jazyk: | angličtina |
| Rok vydání: | 2008 |
| Zdroj: | APPLIED PHYSICS EXPRESS. 1(6) |
| ISSN: | 1882-0778 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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