Effect of substrate temperature on the crystalline of MgO thin films by RF magnetron sputtering--Research works accomplished by using materials a nalysis facilities: XXIX(2)
| Autor: | Goto, Miki, Imai, Yuki, Mitsutaka, Ryo, Nakayama, Hikaru, Misu, Takayuki, Arai, Toshihiko |
|---|---|
| Jazyk: | japonština |
| Rok vydání: | 2019 |
| Předmět: | |
| Zdroj: | 神奈川工科大学研究報告.B,理工学編. 43:17-20 |
| ISSN: | 2188-2878 |
| Popis: | application/pdf Magnesium oxide (MgO) thin films are great concern as electrode protection layer with very high secondary emission coefficient (γ) in the application such as plasma display panel (PDP). We have studied the effect of the substrate temperature on the crystalline structure and the secondary emission coefficient γ of MgO films. The MgO thin films have been fabricated by RF magnetron sputtering technique with various substrate temperatures of growth parameters. The secondary emission coefficient γ were estimated the breakdown voltage in Ne gas. The crystalline structure of the films was confirmed by X-ray diffraction (XRD) analysis. As a result, the preferred orientation of MgO thin films was observed in the [200] plane at substrate temperature between room temperature and 700℃. For temperatures above 500 ℃, [111] plane peak was observed. The secondary emission coefficient γ had a maximum at the substrate temperature of about 500℃. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|