Control of the polarity and surface morphology of GaN films deposited on C-plane sapphire

Autor: Sumiya, Masatomo, Ohnishi, Tsuyoshi, Tanaka, Katsuji, Ohtomo, Akira, Kawasaki, Masashi, KOINUMA, HIDEOMI, Ohtsuka, Kohji, Fuke, Shunro
Jazyk: angličtina
Rok vydání: 1999
Zdroj: MRS Internet Journal of Nitride Semiconductor Research. 4(No. Suppl. 1)
ISSN: 1092-5783
Popis: Suppl. 1 Control of the polarity of GaN films deposited by metalorganic chemical vapor deposition was achieved by substrate nitridation and subsequent annealing of a buffer layer. The surface morphology and optical properties of 1.2 mu m GaN films were influenced by the different growth mode due to the polar direction. Coaxial impact collision ion scattering spectroscopy revealed that the polarity composition of a buffer layer on nitrided sapphire varied by annealing in a H-2 atmosphere. It was considered that the systematic variation of the surface morphology was caused by the polarity composition of the buffer layer.
Databáze: OpenAIRE