Angled Etching of (001) Rutile Nb-TiO2 Substrate by SF6 Based Capacitive Coupled Plasma

Autor:	Matsutani, Akihiro, Shoji, Dai, Kobayashi, Daito, Isobe, Toshihiro, Nakajima, Akira, Matsushita, Sachiko
Jazyk:	angličtina
Rok vydání:	2014
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=jairo_______::4317ec61b2d16ff25148e1220e57efb0 http://t2r2.star.titech.ac.jp/cgi-bin/publicationinfo.cgi?q_publication_content_number=CTT100694092 Zobrazit plný text záznamu