Low-temperature deposition of TiO2 by atmospheric pressure PECVD towards photoanode elaboration for perovskite and solid-state dye-sensitized solar cells
| Autor: | Christelle Dublanche-Tixier, Sylvain Vedraine, Christophe Chazelas, Pascal Tristant, Amelie Perraudeau, Bernard Ratier |
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| Přispěvatelé: | IRCER - Axe 2 : procédés plasmas et lasers (IRCER-AXE2), Institut de Recherche sur les CERamiques (IRCER), Institut des Procédés Appliqués aux Matériaux (IPAM), Université de Limoges (UNILIM)-Université de Limoges (UNILIM)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Institut des Procédés Appliqués aux Matériaux (IPAM), Université de Limoges (UNILIM)-Université de Limoges (UNILIM)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Axe 2 : procédés de traitements de surface, Science des Procédés Céramiques et de Traitements de Surface (SPCTS), Université de Limoges (UNILIM)-Ecole Nationale Supérieure de Céramique Industrielle (ENSCI)-Institut des Procédés Appliqués aux Matériaux (IPAM), Université de Limoges (UNILIM)-Université de Limoges (UNILIM)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Université de Limoges (UNILIM)-Ecole Nationale Supérieure de Céramique Industrielle (ENSCI)-Institut des Procédés Appliqués aux Matériaux (IPAM), RF-ELITE : RF-Electronique Imprimée pour les Télécommunications et l'Energie (XLIM-RFEI), XLIM (XLIM), Université de Limoges (UNILIM)-Centre National de la Recherche Scientifique (CNRS)-Université de Limoges (UNILIM)-Centre National de la Recherche Scientifique (CNRS) |
| Jazyk: | angličtina |
| Rok vydání: | 2019 |
| Předmět: |
Materials science
020209 energy lcsh:TJ807-830 lcsh:Renewable energy sources 02 engineering and technology Chemical vapor deposition 7. Clean energy perovskite solar cells law.invention chemistry.chemical_compound Plasma-enhanced chemical vapor deposition law Solar cell 0202 electrical engineering electronic engineering information engineering Deposition (phase transition) plasma-enhanced chemical vapor deposition Electrical and Electronic Engineering Thin film [PHYS]Physics [physics] Renewable Energy Sustainability and the Environment microwave plasma torch 021001 nanoscience & nanotechnology Condensed Matter Physics Electronic Optical and Magnetic Materials Amorphous solid Dye-sensitized solar cell chemistry Chemical engineering Titanium dioxide Atmospheric pressure 0210 nano-technology |
| Zdroj: | EPJ Photovoltaics EPJ Photovoltaics, EDP sciences, 2019, 10, pp.5. ⟨10.1051/epjpv/2019006⟩ EPJ Photovoltaics, Vol 10, p 5 (2019) |
| ISSN: | 2105-0716 |
| DOI: | 10.1051/epjpv/2019006⟩ |
| Popis: | An original low-temperature atmospheric pressure plasma-enhanced chemical vapor deposition process was used to deposit titanium dioxide thin films. The parametric study in dynamic mode deposition aimed at growing an ideal columnar film composed of aligned anatase monocrystals as solar cell photoanode, previously obtained on silicon wafers in static mode deposition. A process parameters optimization was necessary to deposit onto thermally sensitive glass/FTO substrates. In this paper, the morphology, crystallinity and optical transmission of the coatings have been studied. The coatings display a columnar cauliflower-like structure, composed of TiO2amorphous particles assembly. After deposition, the light transmission properties of the substrate were reduced. As a solution, an ultrasound bath cleaning was set up to enhance the transmitted light through the photoanode. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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