High-Efficiency Stepwise Contraction and Adsorption Nanolithography
Autor: | Zhenqian Ouyang, Maozi Liu, John Ell, Gang-yu Liu, Li Tan, Timothy E. Patten, Jun Hu |
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Rok vydání: | 2006 |
Předmět: |
Materials science
Surface Properties Acrylic Resins Nanotechnology Substrate (printing) Microscopy Atomic Force Elastomer Materials Chemistry Surface roughness Miniaturization Physical and Theoretical Chemistry Nanoscopic scale chemistry.chemical_classification business.industry Polymer Microstructure Elasticity Surfaces Coatings and Films Solutions Nanolithography Elastomers chemistry Silicone Elastomers Optoelectronics Adsorption Rubber business Biotechnology |
Zdroj: | The Journal of Physical Chemistry B. 110:23315-23320 |
ISSN: | 1520-5207 1520-6106 |
DOI: | 10.1021/jp0630323 |
Popis: | A new miniaturization protocol is demonstrated using stretching and relaxation of an elastomer substrate. A designed microstructure is formed on the stretched substrate and subsequently becomes miniaturized when the substrate relaxes. More importantly, the miniaturized structures can be transferred onto a new substrate for further miniaturization or can be utilized as stamps for nanolithography of designated materials. As an example of this approach, an elastic mold was first cast from a Si mold containing periodic line arrays of 1.5-microm line width. Upon relaxation, line width is reduced to 240 nm. The new elastomer may be used as stamps for micro- and nanofabrication of materials such as proteins. The polymer surface roughness or wrinkling behavior at nanoscale is found to follow classic stability model in solid mechanics. This observation provides means to design and control the surface roughness to meet specific requirements. |
Databáze: | OpenAIRE |
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