A comparative study of Cr2O3 thin films obtained by MOCVD using three different precursors
| Autor: | Saulius Kaciulis, Valentino Rigato, G. Carta, Gilberto Rossetto, Marco Natali, Silvio Restello, G. Salmaso, Pierino Zanella, Alessio Mezzi |
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| Jazyk: | angličtina |
| Rok vydání: | 2005 |
| Předmět: |
Materials science
nanoindentation Process Chemistry and Technology Metallurgy Analytical chemistry chemistry.chemical_element coating Surfaces and Interfaces General Chemistry Nanoindentation protection Chromia Elastic recoil detection Chromium X-ray photoelectron spectroscopy chemistry Nuclear reaction analysis MOCVD chromia Thin film Fourier transform infrared spectroscopy |
| Zdroj: | Chemical vapor deposition 11 (2005): 375–380. doi:10.1002/cvde.200406360 info:cnr-pdr/source/autori:Carta G.; Natali M.; Rossetto G.; Zanella P.; Salmaso G.; Restello S.; Rigato V.; Kaciulis S.; Mezzi A./titolo:A comparative study of Cr2O3 thin films obtained by MOCVD using three different precursors/doi:10.1002%2Fcvde.200406360/rivista:Chemical vapor deposition (Print)/anno:2005/pagina_da:375/pagina_a:380/intervallo_pagine:375–380/volume:11 |
| DOI: | 10.1002/cvde.200406360 |
| Popis: | Thin films of chromia (Cr 2 O 3 ) for anti-wear protection were grown by metal-organic (MO)CVD on AISI 304 stainless steel, soda-lime glass, and (001) silicon substrates. The structural, morphological, and chemical compositions were compared for films grown by using three different, commercial, organochromium compounds; Cr(CO) 6 (1), Cr(III) (hexafluoroacetylacetonate) (2), and tris(2,2,6,6-tetra-methyl-3,5-heptanedionato) chromium (III) (3). The depositions were performed using a hot-wall reactor at 500 °C, under 3 torr, using N 2 as the carrier gas and O 2 mixed with water vapor as the reactant gas. The films were analyzed by X-ray diffraction (XRD), atomic force microscopy (AFM), Rutherford backscattering (RBS), nuclear reaction analysis (NRA), elastic recoil detection (ERD), X-ray photoelectron spectroscopy (XPS), and Fourier-transform infrared (FTIR) spectroscopy. The films grown with all three precursors on all three substrates were crystalline with hexagonal Cr 2 O 3 eskalonite structure. FTIR and XPS measurements confirmed the XRD results, showing IR absorption bands characteristic of Cr 2 O 3 and an oxidation state +3 of chromium. The highest growth rate was obtained with precursor (1) (20 nm min -1 ). Films grown with (1) on stainless steel were analyzed by nanoindentation measurements and scratch test to determine the hardness and the film adhesion. |
| Databáze: | OpenAIRE |
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