Investigation of the influence of oxygen plasma on supported silver nanoparticles
| Autor: | Andrew V. Teplyakov, Yichen Duan, John T. Newberg, Sana Rani |
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| Rok vydání: | 2017 |
| Předmět: |
Ostwald ripening
Special Issue on Atomic Layer Deposition (ALD) Materials science Scanning electron microscope Analytical chemistry Nanoparticle 02 engineering and technology Surfaces and Interfaces Substrate (electronics) Chemical vapor deposition 010402 general chemistry 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences Silver nanoparticle 0104 chemical sciences Surfaces Coatings and Films symbols.namesake Chemical engineering X-ray photoelectron spectroscopy symbols Deposition (phase transition) 0210 nano-technology |
| Zdroj: | Journal of vacuum sciencetechnology. A, Vacuum, surfaces, and films : an official journal of the American Vacuum Society. 36(1) |
| ISSN: | 0734-2101 |
| Popis: | Silver deposition precursor molecule trimethylphosphine(hexafluoroacetylacetonato)silver(I) [(hfac)AgP(CH3)3] was used to deposit silver onto water-modified (hydroxyl-terminated) solid substrates. A silicon wafer was used as a model flat surface, and water-predosed ZnO nanopowder was investigated to expand the findings to a common substrate material for possible practical applications. Following the deposition, oxygen plasma was used to remove the remaining organic ligands on a surface and to investigate its effect on the morphology of chemically deposited silver nanoparticles and films. A combination of microscopic and spectroscopic techniques including electron microscopy and x-ray photoelectron spectroscopy was used to confirm the change in the morphology of the deposited material consistent with Ostwald ripening as a result of plasma treatment. Particle agglomeration was observed on the surfaces, and the deposited metallic silver was oxidized to Ag2O following plasma treatment. The fluorine-containing ligands were completely removed. This result suggests that chemical vapor deposition can be used to deposit silver in a very controlled manner onto a variety of substrates using different topography methods and that the post-treatment with oxygen plasma is effective in preparing materials deposited for potential practical applications. |
| Databáze: | OpenAIRE |
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