Pattern Transfer of Sub-10 nm Features via Tin-Containing Block Copolymers
| Autor: | Jeffrey R. Strahan, Michael J. Maher, Emir Gurer, Kazunori Mori, C. Grant Willson, Christopher J. Ellison, Gregory Blachut, William J. Durand, Stephen M. Sirard, Christopher M. Bates, Matthew C. Carlson, Lane Austin, Andrew M. Dinhobl |
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| Jazyk: | angličtina |
| Rok vydání: | 2016 |
| Předmět: |
Materials science
Polymers and Plastics Organic Chemistry chemistry.chemical_element Chain transfer 02 engineering and technology 010402 general chemistry 021001 nanoscience & nanotechnology Block (periodic table) 01 natural sciences 0104 chemical sciences Inorganic Chemistry Orientation control Chemical engineering Polymerization chemistry Polymer chemistry Materials Chemistry Copolymer Lamellar structure Thin film 0210 nano-technology Tin |
| Popis: | Tin-containing block copolymers were investigated as materials for nanolithographic applications. Poly(4-trimethylstannylstyrene-block-styrene) (PSnS-PS) and poly(4-trimethylstannylstyrene-block-4-methoxystyrene) (PSnS-PMOST) synthesized by reversible addition–fragmentation chain transfer polymerization form lamellar domains with periodicities ranging from 18 to 34 nm. Thin film orientation control was achieved by thermal annealing between a neutral surface treatment and a top coat. Incorporation of tin into one block facilitates pattern transfer into SiO_2 via a two-step etch process utilizing oxidative and fluorine-based etch chemistries. |
| Databáze: | OpenAIRE |
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